We produce high-purity titanium sputtering targets with purity from 99.9 percent to 99.995 percent, in planar and rotary configurations. Targets are precision machined and ground, and can be supplied monolithic or bonded to copper backing plates.
High and consistent purity with a certificate of analysis; fine, uniform grain size for stable sputtering rates; high density and low gas content for minimal particle generation; tight dimensional tolerances.
Semiconductor metallization and diffusion barriers; flat panel display and touch screen coatings; decorative and wear-resistant PVD coatings for tools and hardware; optical coatings; data storage media.
Standard diameters are in stock for shipment within one day. Custom sizes, backing plate bonding and special shapes are produced to order.
| Product name | High Quality Gr1Pure Titanium Sputtering/ forging round Target |
| Material | Pure Titanium |
| Grade | Gr1 Gr2 GR5 Gr9 |
| Purity | 99.6% |
| Surface | polished |
| Standard | ASTM B381/348,F67/136,AMS 4928,DIN,JIS |
| Application | Industrial,Aerospace area etc. |
Mechanical Property:
| Grade | Tensile strength Rm/MPa(>=) | Yield strength Rp0.2(MPa) | Elongation A4D(%) | Reduction of area Z(%) |
| Gr1 | 240 | 138 | 24 | 30 |
| Gr2 | 345 | 275 | 20 | 30 |
| Gr3 | 450 | 380 | 18 | 30 |
| Gr4 | 550 | 483 | 15 | 25 |
